PMGI & LOR | Products Lineup | NIPPON KAYAKU CO.,LTD.
PMGI & LOR resists are commonly used as under layers in very high resolution or very thick bi-layer metal lift-off processes.
They are also used as sacrificial layers to form air bridges and other 3-D structures. PMGI & LOR resists won’t intermix with conventional photo resists, are compatible with TMAH and metal ion containing developers and strip cleanly and easily in NMP-based resist strippers.
Compatible with most photoresists & developers
Easy to tune re-entrant sidewall profiles
Strips easily in NMP-based strippers
Available in a wide range of film thicknesse