Photoresist for MEMS and Semiconductor Package

KMPR100
SU-8 3000
PMGI & LOR
Remover K

KMPR1000 | Products Lineup | NIPPON KAYAKU CO.,LTD.

kmpr1000
KMPR 1000 i-Line photoresist is a high contrast, epoxy based photoresist that can be developed in a conventional aqueous alkaline developer(TMAH)and readily stripped from the wafer.
KMPR 1000 has excellent adhesion, chemical and plasma resistance, making it ideal for many MEMS, Electrolytic Plating and DRIE applications.
Features
6-120 μm film thickness in a single coat
Aqueous developer compatible(2.38% TMAH)
Wet strips in conventional strippers
High aspect ratio imaging
Excellent plating resistance
Excellent dry etch resistance
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kmpr1000