KMPR1000 | Products Lineup | NIPPON KAYAKU CO.,LTD.
KMPR 1000 i-Line photoresist is a high contrast, epoxy based photoresist that can be developed in a conventional aqueous alkaline developer（TMAH）and readily stripped from the wafer.
KMPR 1000 has excellent adhesion, chemical and plasma resistance, making it ideal for many MEMS, Electrolytic Plating and DRIE applications.
6-120 μm film thickness in a single coat
Aqueous developer compatible（2.38% TMAH）
Wet strips in conventional strippers
High aspect ratio imaging
Excellent plating resistance
Excellent dry etch resistance